P-ISSN: 2707-6636, E-ISSN: 2707-6644
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2024, Vol. 5, Issue 1, Part A
On approach for estimation of maximal continuance of diffusion and ion type of doping
Author(s): EL Pankratov
Abstract:
In this paper an analytical approach for estimation of maximal continuance of manufacturing of integrated circuit elements by dopant diffusion and ion implantation has been introduced. We analyzed influence of parameters of considered technological processes on the value of it's maximal continuance.
Keywords: manufacturing of integrated circuit elements; dopant diffusion; ion implantation; maximal continuance of technological processes; analytical approach for prognosis.
DOI: 10.33545/27076636.2024.v5.i1a.88
Pages: 11-30 | Views: 121 | Downloads: 58
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How to cite this article:
EL Pankratov. On approach for estimation of maximal continuance of diffusion and ion type of doping. Int J Comput Programming Database Manage 2024;5(1):11-30. DOI: 10.33545/27076636.2024.v5.i1a.88
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