International Journal of Circuit, Computing and Networking

P-ISSN: 2707-5923, E-ISSN: 2707-5931
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2024, Vol. 5, Issue 1, Part A

Impact of Nano-scale fabrication on the performance of semiconductor devices


Author(s): Ceara Deasy

Abstract:
Nano-scale fabrication techniques have revolutionized the semiconductor industry by enabling the production of devices with unprecedented performance characteristics. This paper explores the impact of nano-scale fabrication on the performance of semiconductor devices, examining the benefits, challenges, and future prospects. We focus on key performance metrics such as speed, power consumption, and thermal management, and discuss how advances in fabrication techniques have led to significant improvements in these areas. Additionally, we address the technical and economic challenges associated with nano-scale fabrication and suggest potential solutions to overcome these hurdles.


DOI: 10.33545/27075923.2024.v5.i1a.63

Pages: 24-26 | Views: 95 | Downloads: 45

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International Journal of Circuit, Computing and Networking
How to cite this article:
Ceara Deasy. Impact of Nano-scale fabrication on the performance of semiconductor devices. Int J Circuit Comput Networking 2024;5(1):24-26. DOI: 10.33545/27075923.2024.v5.i1a.63
International Journal of Circuit, Computing and Networking

International Journal of Circuit, Computing and Networking

International Journal of Circuit, Computing and Networking
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